SPring-8, the large synchrotron radiation facility

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  BL37XU is a hard X-ray undulator beamline that is mainly used for studies of X-ray micro/nano-spectrochemical analysis such as XRF/XAFS imaging, wavelength-dispersive XAFS, depth-resolved XAFS, TXRF and XRF holography. This beamline has two branches (A and B) and three experimental hutches. The branch A consists of standard undulator-beamline optics such as a double crystal monochromator, and branch B consists of a specially designed optics for high-energy X-rays such as a single crystal monochromator.
  From 2011A, the nanobeam X-ray fluorescence spectrometer is available to users at BL37XU, enabling them to perform analyses using 100-nm-order X-ray beams. The spectrometer has been installed by the SR Nano-Beam Analysis Center for Green/Nano-technologies (participating institution: RIKEN), a satellite of the "Research Base Networks to Develop a Low-Carbon Society" project initiated with a second supplementary budget for fiscal 2009 as part of the Environmental Energy Technology Innovation Plan, which is stationed as a Stepping Stone for Growth Strategy.

The SR Nano-Beam Analysis Center for Green/Nano-technologies:


  • X-ray spectrochemical analysis using micro/nano beam
  • Ultra trace element analysis
  • High energy X-ray fluorescence analysis


  • Scientific field
    Material science, Environmental science, Geochemistry, Biology, Archaeology, Forensic science
  • Equipment
    X-ray focusing elements (Kirkpatrick and Baez (K-B) mirror, Fresnel zone plate), High spatial resolution X-ray microprobe, Multipurpose X-ray diffractometer, X-ray fluorescence analyzer, Bent crystal Laue analyzer, 2-dimensional pixel array detector


  The light source of BL37XU is an in-vacuum type undulator, whose period length is 32 mm and the number of period is 140. The energy range from 4.5 to 18.8 keV is covered by the fundamental radiation from the light source by tuning its gap from 8 to 50 mm. Figure 1 shows a schematic view of the beamline. A front-end in the storage ring tunnel and a transport channel in the optics hutch are composed of the standard components. Features of this beamline are to consist of three experimental hutches supplying focused X-ray beam from 100 nm to several hundred micron and to consist of two branches: one is a SPring-8 standard undulator-beamline optics branch (Branch A) and the other is a high-energy branch (Branch B). Details of these branches are shown in the following.

  • Branch A : standard undulator-beamline optics branch

      White undulator radiation is further monochromatized using a SPring-8 standard liquid nitrogen cooled double-crystal monochromator located at 43 m from the source. The monochromator covers a wide energy range by switching two set of crystal pair; from 4.5 to 37.7 keV by Si 111 ∼ Si 111 pair and from 12 to 113 keV by Si 333 ∼ Si 511 pair. The flux density of the monochromatic beam measured at 52 m from the source is more than 1013photons/s from 8 to 30 keV. Two horizontal deflecting mirrors are placed downstream of the monochromator in order to eliminate higher harmonics and to obtain focused X-ray beam in horizontal direction. The coatings are stripes of Pt and Rh, which are switched depending on the energy region of the measurement.

  • Branch B : high-energy branch

      A single-bounce Si 111 monochromator which deflects the beam horizontally is located upstream of the double crystal monochromator, 37 m from the source. The Bragg angle of monochromator is fixed at 1.5°, so that the available X-ray energy in the B branch is 75.5 keV.

Fig.1 Schematic view of the beamline
  • X-rays beam parameters
    • Branch A


      Energy range 4.5 ∼ 113 keV
      Resolution ΔE/E 2 × 10-4 (Si (111))
      Flux at sample 1012 ∼ 1013 photons/s
      Beam size at sample 0.7 (V) × 2 (H) mm2
      Minimum focused beam size 100 (V)×100 (H) nm2
      Higher harmonic content < 1 × 10-4


    • Branch B


      Energy range Si (111) : 75.5 keV
      Resolution ΔE/E 2 × 10-4
      Flux at sample 1010 ∼ 1012 photons/s
      Beam size at sample 0.5 (V) × 3 (H) mm2
      Higher harmonic content < 1 × 10-4



  The beamline has three tandem experimental hutches (EH1, EH2 and EH3), which are located at 55 m, 62 m and 76 m from the source. The size of experimental hutch are 8 (L) × 5 (W) × 3.3 (H) m3, 6 (L) × 4 (W) × 3.3 (H) m3 and 6 (L) × 3.5 (W) × 3.3 (H) m3, respectively. In EH1, sub-micron spatial resolution X-ray microprobe [1] is installed in branch A (Fig.2), and a high-energy X-ray fluorescence spectrometer is available in branch B. In the EH2, a multi-purpose diffractometer, 19-element Ge detector, 2-dimensional pixel array detector and bent crystal Laue analyzer are equipped (Fig.3). XAFS methods using high flux X-ray beam of several hundred micron, such as wavelength dispersive XAFS method are available. In the EH3, 100 nm spatial resolution X-ray microprobe is installed [3] (Fig.4). The outline of the scanning X-ray microprobe and the high-energy X-ray spectroscopic analysis system are described in the following section.
 To realize energy tunable X-ray micro/nano beam, K-B mirror optics is adopted in X-ray microprobe system. In the EH1, the beam size was 860 (H) × 860 (V) nm2, and the flux was estimated to be more than 1010 photons/s at 10 keV. In the EH3, two experimental modes are available; one is high flux mode and the other is high spatial resolution mode. In the high flux mode, the beam size was 480 (H) × 320 (V) nm2, and the flux was estimated to be more than 1011 photons/s. In the high spatial resolution mode, the beam size was 100 (H) × 100 (V) nm2, and the flux was estimated to be more than 109 photons/s [3] by highly precise slit system used as spatial filter.
 The Si 333 ∼ Si 511 double crystal monochromator realizes higher-energy X-ray spectroscopic analysis in branch A (< 113 keV) than that in branch B (75.5 keV). This enhances flexibility of high-energy XRF and enables high-energy XAFS. Figure 5 shows high-energy XRF spectra of NIST SRM612 silicate glass which is used as a reference material for various analytical methods and is doped with 61 trace elements at the 50 ppm level [4].

Fig.2 Sub-micron spatial-resolved scanning x-ray microscope

Fig,3 Wavelength dispersive XAFS measurement system

Fig.4 100 nm spatial-resolved scanning x-ray microscope

Fig.5 XRF spectrum of SRM 611 glass sample (exposure time: 1000 s)
  • References
  1. Suzuki M., Terada Y., Ohashi H., SPring-8 Research Frontiers 2011, 149-150 (2012).
  2. Terada Y., Tanida H., Uruga T., Takeuchi A., Suzuki Y., Goto S., AIP Conf. Proc. , 1365, 172-175 (2011).
  3. Ohashi H., Terada Y., et al,J. Phys: Conf. Ser. , 425, 052018 (2013).
  4. Suzuki M., Terada Y., et al.,SPring-8 Riyosha Joho , 16, 201-209 (2011).



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Please note that each e-mail address is followed by "@spring8.or.jp."

Kiyofumi NITTA
SPring-8 / JASRI
1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198
Phone : +81-(0)791-58-0833
Fax : +81-(0)791-58-0830
e-mail : nittak

SPring-8 / JASRI
1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198
Phone : +81-(0)791-58-0833
Fax : +81-(0)791-58-0830
e-mail : yterada

SPring-8 / JASRI
1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198
Phone : +81-(0)791-58-0833
Fax : +81-(0)791-58-0830
e-mail : sekizawa

Last modified 2017-10-06 17:10