大型放射光施設 SPring-8

Language：English

Speaker：Dr. Josephine Gutekunst

Affiliation：Microworks GmbH

Title：X-ray Optical Elements Fabricated by X-ray Lithography

Abstract：
X-ray lithography is a versatile microfabrication technique enabling the production of high-aspect-ratio microstructures with tall and narrow features on large substrates. Typical feature widths range from a few micrometers up to one millimeter, making the method well-suited for applications requiring precise micro-optical geometries. This talk will provide an overview of the X-ray lithography process developed at Karlsruhe Institute of Technology and its spin-off company Microworks GmbH, and highlight its application in fabricating absorptive and refractive X-ray optical elements produced by deep X-ray lithography. Among other optics, we will look in more detail at X-ray gratings and their applications in grating-based interferometry, such as the Talbot-Lau interferometer, as well as focus on compound refractive X-ray lenses (CRLs) and compare different lens types and materials.