Particle size distribution analysis for nano-SiO2 powder by ultra-small angle X-ray scattering
Inquiry number
SOL-0000000873
Beamline
BL15XU (RIKEN Materials Science III)
Scientific keywords
| A. Sample category | inorganic material, research on method, instrumentation |
|---|---|
| B. Sample category (detail) | amorphous, glass |
| C. Technique | |
| D. Technique (detail) | small angle scattering, ultra small angle |
| E. Particular condition | |
| F. Photon energy | X-ray (4-40 keV) |
| G. Target information |
Industrial keywords
| level 1---Application area | Semiconductor, Chemical product, industrial material |
|---|---|
| level 2---Target | silicon semiconductor, catalysis |
| level 3---Target (detail) | interlayer insulator |
| level 4---Obtainable information | particle-size distribution |
| level 5---Technique | SAXS |
Classification
A80.30 inorganic material, M20.10 SAX
Body text
This example shows particle size distribution analysis for amorphous nano-SiO2 powder by ultra-small angle X-ray scattering. In small angle X-ray scattering experiment at BL15XU, high quality data with low back ground noise can be obtained because of small angular dispersion and large intensity of X-ray beam from undulator. As shown in figure, particle size distribution of amorphous nano-SiO2 powder successfully obtained by this method.
[ H. Hashimoto, T. Nagumo, T. Inaba, Y. Furukawa, M. Okui and S. Fukushima, Applied Surface Science 241, 227-230 (2005), Fig. 2,
©2005 Elsevier Science Publisher ]
Source of the figure
Original paper/Journal article
Journal title
Applied Surface Science 241(2005),227-230
Figure No.
Figure 2
Technique
Source of the figure
No figure
Required time for experimental setup
12 hour(s)
Instruments
| Instrument | Purpose | Performance |
|---|---|---|
| Small Angle X-Ray Scettering | Measure the strength of Small Angle Scettering | samples:1-200nm |
References
| Document name |
|---|
| Applied Surface Science 241(2005),227-230 |
| J.Synchrotron Rad.(2003). 10, 424-429 |
Related experimental techniques
Questionnaire
This solution is an application of a main instrument of the beamline.
With user's own instruments.
Ease of measurement
With a great skill
Ease of analysis
With a great skill
How many shifts were needed for taking whole data in the figure?
More than ten shifts