Inquiry number

INS-0000000390

ABSTRACT

This beamline, together with its sister beamline BL16B2, is a contract beamline designed and constructed by an industrial consortium of 13 companies to characterize various materials for industrial purpose. Apparatuses for X-ray diffraction, hard X-ray photoelectron spectroscopy, X-ray microscopy and X-ray fluorescence spectroscopy are installed and utilized for development of various industrial materials.

AREA OF RESEARCH

• Characterization of various industrial materials for secondary batteries, fuel cells, catalysts, steels, semiconductors, optical and magnetic devices and others.

KEYWORDS

• Scientific field
  X-ray diffraction, hard X-ray photoelectron spectroscopy, X-ray fluorescence spectroscopy, X-ray reflectivity, micro analysis and scanning X-ray microscopy, X-ray magnetic circular dichroism (XMCD) spectroscopy and magnetic hysteresis measurement
• Equipment
  X-ray diffractometer, two-dimensional detector, hard X-ray photoelectron spectrometer, X-ray fluorescence spectrometer, Fresnel zone plate, focusing mirrors in a Kirkpatrick-Baez geometry, diamond phase plate, reactive gas equipment for in-situ measurement (shared with BL16B2), glovebox (shared with BL16B2)

SOURCE AND OPTICS

• X-rays at sample

  Energy range	4.5 ∼ 40 keV
  Energy resolution	ΔE/E ∼ 10-4
  Photon flux	normal ∼ 1012 photons/s focusing ∼ 1010 photons/s
  Beam Size	normal < 1(H) × 1(V) focusing < 1 μm(H)×1 μm(V)

  

  Schematic View of Beamline

  

  Photograph of beamline BL16XU and BL16B2

EXPERIMENTAL STATIONS

Apparatuses for X-ray diffraction, hard X-ray photoelectron spectroscopy, X-ray microscopy are installed in tandem. A space is prepared at the most downstream side for user’s bringing-in device. The X-ray fluorescence spectrometer is carried into the hutch when used.

• Hard X-ray photoelectron spectrometer　(Fig. 1)
  • Total energy resolution is less than 250 meV with excitation energy of 6 keV, 8 keV and 10 keV.
  • Charge neutralizer by co-irradiation of low-energy electrons and Ar+ ions is equipped.
  • Air-sensitive samples can be introduced into the spectrometer without atmospheric exposure by using dedicated sample transfer vessel.
    

    Fig. 1 Hard X-ray photoelectron spectrometer

• X-ray diffractometer (Fig. 2)
  • An 8-axis diffractometer is installed and used for X-ray diffraction, X-ray reflectivity, grazing incidence X-ray scattering and others.
  • Various types of detectors such as NaI (Tl), YAP (Ce) scintillation counter, one-dimensional detector (Mythen) and two-dimensional detector (PILATUS 100K and PILATUS 300K) are available.
    

    Fig. 2 X-ray diffractometer

• Microbeam experiment system (Fig.3)
  • Two microbeam formation systems (Kirkpatric-Baez mirror and Fresnel zone plate) are available.
  • Beam size of 0.20 µm×0.23 µm is achieved using Kirkpatric-Baez mirror.
  • Microscopic measurements of X-ray diffraction, X-ray fluorescence, XAFS and X-ray magnetic circular dichroism are possible by using microbeam experiment system.
    

    Fig.3 Microbeam experiment system

• X-ray fluorescence spectrometer (Fig. 4)
  • Sample chamber evacuated to 10 Pa or filled with He-gas at normal pressure.
  • X-ray fluorescence spectroscopy and XAFS are available by wavelength-dispersive and energy-dispersive methods.
    

    Fig. 4 X-ray fluorescence spectrometer

PUBLICATION SEARCH

* Sorry, Some parts of results are displayed using Japanese characters.

BL16XU PUBLICATION SEARCH

CONTACT INFORMATION

Hiroshi DEGUCHI
The Kansai Electric Power Co., Ltd
11-20, Nakoji 3-chome, Amagasaki-shi, Hyogo 661-0974
Phone : +81-6-6491-0221(R&D Center)
e-mail : deguchi.hiroshic4.kepco.co.jp

Website

https://sunbeam.spring8.or.jp/