位相回復Ｘ線回折法
Inquiry number
SOL-0000001540
Beamline
BL29XU (RIKEN Coherent X-ray Optics)
Scientific keywords
| A. Sample category | research on method, instrumentation |
|---|---|
| B. Sample category (detail) | semiconductor |
| C. Technique | X-ray diffraction |
| D. Technique (detail) | coherent scattering, phase measurement |
| E. Particular condition | X-ray microscopy |
| F. Photon energy | X-ray (4-40 keV) |
| G. Target information | structure analysis |
Industrial keywords
| level 1---Application area | Semiconductor |
|---|---|
| level 2---Target | silicon semiconductor |
| level 3---Target (detail) | |
| level 4---Obtainable information | molphology |
| level 5---Technique | diffraction, imaging |
Classification
A80.20 metal ・material, A80.30 inorganic material
Body text
位相回復Ｘ線回折法は、回折Ｘ線波の複素振幅の解析性を用いた位相コントラスト可視化法です。
図に示すのは、シリコン製微細加工パターンの回折強度データと再生像です。
図 シリコン製微細加工パターンからのＸ線回折強度プロファイル
図 Ｘ線回折強度プロファイルから再生した試料厚変動
[ A. V. Darahanau, A. Y. Nikulin, A. Souvorov, Y. Nishino, B. C. Muddle and T. Ishikawa, Optics Communications 251, 100-108 (2005), Fig. 2, 3,
©2005 Elsevier B. V. ]
Source of the figure
Original paper/Journal article
Journal title
A.V. Darahanau, A.Y. Nikulin, A. Souvorov, Y. Nishino, B.C. Muddle, and T. Ishikawa, Optics Communications 251, 100-108 (2005)
Figure No.
2,3
Technique
Ｘ線回折強度プロファイルはアナライザ結晶の角度をスキャンすることによって測定されます。
図 位相回復Ｘ線回折法の実験配置
[ A. V. Darahanau, A. Y. Nikulin, A. Souvorov, Y. Nishino, B. C. Muddle and T. Ishikawa, Optics Communications 251, 100-108 (2005), Fig. 1(a),
©2005 Elsevier B. V. ]
Source of the figure
Original paper/Journal article
Journal title
A.V. Darahanau, A.Y. Nikulin, A. Souvorov, Y. Nishino, B.C. Muddle, and T. Ishikawa, Optics Communications 251, 100-108 (2005)
Figure No.
1(a)
Required time for experimental setup
24 hour(s)
Instruments
References
| Document name |
|---|
| A.V. Darahanau, A.Y. Nikulin, A. Souvorov, Y. Nishino, B.C. Muddle, and T. Ishikawa, Opt. Commun. 251, 100-108 (2005) |
| A.V. Darahanau, A.Y. Nikulin, A. Souvorov, Y. Nishino, B.C. Muddle, and T. Ishikawa, Phys. Lett. A 335, 494-498 (2005) |
| A. Y. Nikulin, A. V. Darahanau, R. Horney, and T. Ishikawa, Physica B 349, 281-295 (2004) |
| K. Siu, A. Y. Nikulin, K. Tamasaku, and T. Ishikawa, Appl. Phys. Lett. 79, 2112-2114 (2001) |
| K. Siu, A. Y. Nikulin, K. Tamasaku, and T. Ishikawa, J. Phys. D: Appl. Phys. 34, 2912-2917 (2001) |
Related experimental techniques
Questionnaire
With user's own instruments.
Ease of measurement
With a great skill
Ease of analysis
With a great skill
How many shifts were needed for taking whole data in the figure?
Four-nine shifts