BL16B2 OUTLINE

Inquiry number

INS-0000000384

ABSTRACT

This beamline, together with its sister beamline BL16XU, is designed by an industrial consortium of 13 companies to characterize various materials developed for industrial purpose.
The main experiments on this beamline are XAFS and X-ray topography, and in some cases X-ray diffraction and X-ray fluorescent analysis. The energy range from the titanium K-edge to the thulium K-edge is covered.

AREA OF RESEARCH

Characterization of industrial materials, such as metal and oxide films, semiconductor crystals, etc., by XAFS, topography and other methods

KEYWORDS

Scientific field
XAFS, Topography, X-ray reflectivity, X-ray fluorescent analysis
Equipment
Precision goniometers, Mirror, Slits, Cryostat, Solid state detector, Scintillation detector, Ionization chambers, Lytle type detector, Conversion electron yield detector, Imaging plate, NIM system

SOURCE AND OPTICS

X-rays at sample

Energy range	4.5 ∼ 113 keV
Energy resolution	ΔE/E ∼ 10^-4
Photon flux	∼ 10¹⁰ph/s
Beam size	~ 0.1(H) × 0.1(V) (with mirror) ~ 40(H) × 2(V) (without mirror)

Schematic View of Beamline

EXPERIMENTAL STATIONS

Experimental table
Precision goniometer
Two- axis (ω1, ω2) precision goniometer
Two- axis (ω -2θ) goniometer
Mirror
4-jaw slits
Vacuumpump
Cryostat
Solid state detector, Scintillation detector, Ionization chambers, Lytle type detector, conversion electron yield detector
Imaging plate
Stage for XAFS experiment
NIM bin, Power supply, Counters, MCA, Current AMPs
Oscilloscope
Gas(H₂, N₂, Ar, Ar+N₂, Kr)