Inquiry number

INS-0000000384

ABSTRACT

  This beamline, together with its sister beamline BL16XU, is designed by an industrial consortium of 13 companies to characterize various materials developed for industrial purpose.
  The main experiments on this beamline are XAFS and X-ray topography, and in some cases X-ray diffraction and X-ray fluorescent analysis. The energy range from the titanium K-edge to the thulium K-edge is covered.

AREA OF RESEARCH

• Characterization of industrial materials, such as metal and oxide films, semiconductor crystals, etc., by XAFS, topography and other methods

KEYWORDS

• Scientific field
  XAFS, Topography, X-ray reflectivity, X-ray fluorescent analysis
• Equipment
  Precision goniometers, Mirror, Slits, Cryostat, Solid state detector, Scintillation detector, Ionization chambers, Lytle type detector, Conversion electron yield detector, Imaging plate, NIM system

SOURCE AND OPTICS

• X-rays at sample

  Energy range	4.5 ∼ 113 keV
  Energy resolution	ΔE/E ∼ 10-4
  Photon flux	∼ 1010ph/s
  Beam size	~ 0.1(H) × 0.1(V) (with mirror) ~ 40(H) × 2(V) (without mirror)

  

  Schematic View of Beamline

EXPERIMENTAL STATIONS

• Experimental table
• Precision goniometer
• Two- axis (ω1, ω2) precision goniometer
• Two- axis (ω -2θ) goniometer
• Mirror
• 4-jaw slits
• Vacuumpump
• Cryostat
• Solid state detector, Scintillation detector, Ionization chambers, Lytle type detector, conversion electron yield detector
• Imaging plate
• Stage for XAFS experiment
• NIM bin, Power supply, Counters, MCA, Current AMPs
• Oscilloscope
• Gas(H₂, N₂, Ar, Ar+N₂, Kr)
  

PUBLICATION SEARCH

* Sorry, Some parts of results are displayed using Japanese characters.

CONTACT INFORMATION

Yoshihiro KUDO
Materials Laboratories, Sony Corporation
4-16-1 Okata, Atsugi 243-0021
Phone : +81-46-226-2527
FAX : +81-46-226-2178
e-mail :