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Phase retrieval x-ray diffractometry

Inquiry number

SOL-0000001047

Beamline

BL29XU (RIKEN Coherent X-ray Optics)

Scientific keywords

A. Sample category research on method, instrumentation
B. Sample category (detail) semiconductor
C. Technique X-ray diffraction
D. Technique (detail) coherent scattering, phase measurement
E. Particular condition X-ray microscopy
F. Photon energy X-ray (4-40 keV)
G. Target information structure analysis

Industrial keywords

level 1---Application area Semiconductor
level 2---Target silicon semiconductor
level 3---Target (detail)
level 4---Obtainable information molphology
level 5---Technique diffraction, imaging

Classification

A80.20 metal ・material, A80.30 inorganic material

Body text

Phase retrieval x-ray diffractometry is a phase contrast imaging technique using analytic properties of the complex amplitude of the diffracted x-ray wave.
The following figures show the x-ray diffraction intensity profile and the reconstructed image of a micro-fabricated silicon pattern.

Fig. X-ray diffraction intensity profile of a micro-fabricated silicon pattern

 

Fig. Variation of the sample thickness reconstructed from the x-ray diffraction intensity profile

[ A. V. Darahanau, A. Y. Nikulin, A. Souvorov, Y. Nishino, B. C. Muddle and T. Ishikawa, Optics Communications 251, 100-108 (2005), Fig. 2, 3,
©2005 Elsevier B. V. ]

 

Source of the figure

Original paper/Journal article

Journal title

A.V. Darahanau, A.Y. Nikulin, A. Souvorov, Y. Nishino, B.C. Muddle, and T. Ishikawa, Optics Communications 251, 100-108 (2005)

Figure No.

2,3

Technique

The x-ray diffraction intensity profile of a sample is measured by scanning the analyzer crystal angle.

 

Fig. Experimental setup of phase retrieval x-ray diffractometry

[ A. V. Darahanau, A. Y. Nikulin, A. Souvorov, Y. Nishino, B. C. Muddle and T. Ishikawa, Optics Communications 251, 100-108 (2005), Fig. 1(a),
©2005 Elsevier B. V. ]

 

Source of the figure

Original paper/Journal article

Journal title

A.V. Darahanau, A.Y. Nikulin, A. Souvorov, Y. Nishino, B.C. Muddle, and T. Ishikawa, Optics Communications 251, 100-108 (2005)

Figure No.

1(a)

Required time for experimental setup

24 hour(s)

Instruments

References

Document name
A.V. Darahanau, A.Y. Nikulin, A. Souvorov, Y. Nishino, B.C. Muddle, and T. Ishikawa, Opt. Commun. 251, 100-108 (2005)
A.V. Darahanau, A.Y. Nikulin, A. Souvorov, Y. Nishino, B.C. Muddle, and T. Ishikawa, Phys. Lett. A 335, 494-498 (2005)
A. Y. Nikulin, A. V. Darahanau, R. Horney, and T. Ishikawa, Physica B 349, 281-295 (2004)
K. Siu, A. Y. Nikulin, K. Tamasaku, and T. Ishikawa, Appl. Phys. Lett. 79, 2112-2114 (2001)
K. Siu, A. Y. Nikulin, K. Tamasaku, and T. Ishikawa, J. Phys. D: Appl. Phys. 34, 2912-2917 (2001)

Related experimental techniques

Questionnaire

With user's own instruments.

Ease of measurement

With a great skill

Ease of analysis

With a great skill

How many shifts were needed for taking whole data in the figure?

Four-nine shifts

Last modified 2019-11-21 16:52