超精密Ｘ線全反射ミラー

Inquiry number

SOL-0000001537

Beamline

BL29XU (RIKEN Coherent X-ray Optics)

Scientific keywords

A. Sample category	research on method, instrumentation
B. Sample category (detail)	semiconductor
C. Technique	X-ray elastic scattering
D. Technique (detail)	reflection, refraction
E. Particular condition	microbeam (sub-µm)
F. Photon energy	X-ray (4-40 keV)
G. Target information	local structure

Industrial keywords

level 1---Application area	others
level 2---Target
level 3---Target (detail)
level 4---Obtainable information	local structure
level 5---Technique	reflectometry

Classification

A30.20 surface・interface

Body text

超精密全反射ミラーの開発により、X線ナノ集光光学の技術革新を進めています。Plasma CVM (Chemical Vaporization Machining)とEEM (Elastic Emission Machining)という二つの技術を組み合わせ、原子レベルの形状精度を持つミラーが加工されます。
図に示すのは、二枚の集光ミラーをKirkpatrick-Baez配置で用い行われた、二次元集光の結果です。集光サイズ36 nm 48 nmの回折限界集光が達成されました。

図　ナノ集光ビームの強度プロファイル

[ H. Mimura, S. Matsuyama, H. Yumoto, H. Hara, K. Yamamoto, Y. Sano, M. Shibahara, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa and K. Yamauchi, Japanese Journal of Applied Physics 44, L539-L542 (2005), Fig. 3,
©2005 日本応用物理学会 ]

Source of the figure

Original paper/Journal article

Journal title

H. Mimura, S. Matsuyama, H. Yumoto, H. Hara, K. Yamamura, Y. Sano, M. Shibahara, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, and K. Yamauchi, Jpn. J. Appl. Phys. 44, L539-L542 (2005)

Figure No.

Technique

二枚の集光ミラーをKirkpatrick-Baez配置で用いX線ビームを二次元集光します。

図　Kirkpatrick-Baezミラー系によるＸ線ビームの二次元集光

[ H. Mimura, S. Matsuyama, H. Yumoto, H. Hara, K. Yamamura, Y. Sano, M. Shibahara, K. Endo, Y. Mori and T. Noshino, Japanese Journal of Applied Physics 44, L539-L542 (2005), Fig. 1,
©2005 日本応用物理学会 ]

Source of the figure

Original paper/Journal article

Journal title

Figure No.

Required time for experimental setup

24 hour(s)

Instruments

Instrument	Purpose	Performance
Kirkpatrick-Baez型Ｘ線集光装置

References

Document name
S. Matsuyama, H. Mimura, H. Yumoto, K. Yamamura, Y. Sano, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, T. Ishikawa, M. Yabashi, and K. Yamauchi, Rev. Sci. Instrum. 76, 083114 (2005)
H. Yumoto, H. Mimura, S. Matsuyama, H. Hara, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, and K. Yamauchi, Rev. Sci. Instrum. 76, 063708 (2005)
H. Mimura, S. Matsuyama, H. Yumoto, H. Hara, K. Yamamura, Y. Sano, M. Shibahara, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, and K. Yamauchi, Jpn. J. Appl. Phys. 44, L539-L542 (2005)
H. Mimura, H. Yumoto, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, and K. Yamauchi, Rev. Sci. Instrum. 76, 045102 (2005)
H. Mimura, K. Yamauchi, K. Yamamura, A. Kubota, S. Matsuyama, Y. Sano, K. Ueno, K. Endo, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, and Y. Mori, J. Synchrotron Rad. 11, 343-346 (2004)
K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori, Jpn. J. Appl. Phys. 42, 7129-7134 (2003)
K. Yamamura, K. Yamauchi, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori, Rev. Sci. Instrum. 74, 4549-4553 (2003)
K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori, Rev. Sci. Instrum. 74, 2894-2898 (2003)
K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori, J. Synchrotron Rad. 9, 313-316 (2002)
A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, Y. Mori, K. Yamauchi, K. Yamamura, and A. Saito, J. Synchrotron Rad. 9, 223-228 (2002)

Related experimental techniques

Questionnaire

With user's own instruments.

Ease of measurement

With a great skill

Ease of analysis

Middle

How many shifts were needed for taking whole data in the figure?

Four-nine shifts

Last modified

SPring-8, the large synchrotron radiation facility

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