Ultra-precise x-ray total reflection mirrors
Inquiry number
SOL-0000000973
Beamline
BL29XU (RIKEN Coherent X-ray Optics)
Scientific keywords
A. Sample category | research on method, instrumentation |
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B. Sample category (detail) | semiconductor |
C. Technique | X-ray elastic scattering |
D. Technique (detail) | reflection, refraction |
E. Particular condition | microbeam (sub-µm) |
F. Photon energy | X-ray (4-40 keV) |
G. Target information | local structure |
Industrial keywords
level 1---Application area | others |
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level 2---Target | |
level 3---Target (detail) | |
level 4---Obtainable information | local structure |
level 5---Technique | reflectometry |
Classification
A30.20 surface・interface
Body text
The development of ultra-precise x-ray total reflection mirrors has been promoting technological innovation in nano-focusing x-ray optics. Mirrors with an atomic-precision surface figure can be manufactured by combining the two technologies of CVM (Chemical Vaporization Machining) and EEM (Elastic Emission Machining).
The following figure shows the result of 2D nano-focusing with two focusing mirrors in the Kirkpatrick-Baez configuration. Diffraction limited focusing with a focal size of 36 nm 48 nm was achieved.
Fig. Intensity profile of nano-focusing beam.
[ H. Mimura, S. Matsuyama, H. Yumoto, H. Hara, K. Yamamoto, Y. Sano, M. Shibahara, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa and K. Yamauchi, Japanese Journal of Applied Physics 44, L539-L542 (2005), Fig. 3,
©2005 The Japan Society of Applied Physics ]
Source of the figure
Original paper/Journal article
Journal title
H. Mimura, S. Matsuyama, H. Yumoto, H. Hara, K. Yamamura, Y. Sano, M. Shibahara, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, and K. Yamauchi, Jpn. J. Appl. Phys. 44, L539-L542 (2005)
Figure No.
3
Technique
Two-dimensional focusing of an x-ray beam is performed using two focusing mirrors in the Kirkpatrick-Baez configuration.
Fig. Two-dimensional focusing of an x-ray beam using Kirkpatrick-Baez mirror system.
[ H. Mimura, S. Matsuyama, H. Yumoto, H. Hara, K. Yamamura, Y. Sano, M. Shibahara, K. Endo, Y. Mori and T. Noshino, Japanese Journal of Applied Physics 44, L539-L542 (2005), Fig. 1,
©2005 The Japan Society of Applied Physics ]
Source of the figure
Original paper/Journal article
Journal title
H. Mimura, S. Matsuyama, H. Yumoto, H. Hara, K. Yamamura, Y. Sano, M. Shibahara, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, and K. Yamauchi, Jpn. J. Appl. Phys. 44, L539-L542 (2005)
Figure No.
1
Required time for experimental setup
24 hour(s)
Instruments
Instrument | Purpose | Performance |
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Kirkpatrick-Baez type x-ray focusing system |
References
Document name |
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S. Matsuyama, H. Mimura, H. Yumoto, K. Yamamura, Y. Sano, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, T. Ishikawa, M. Yabashi, and K. Yamauchi, Rev. Sci. Instrum. 76, 083114 (2005) |
H. Yumoto, H. Mimura, S. Matsuyama, H. Hara, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, and K. Yamauchi, Rev. Sci. Instrum. 76, 063708 (2005) |
H. Mimura, S. Matsuyama, H. Yumoto, H. Hara, K. Yamamura, Y. Sano, M. Shibahara, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, and K. Yamauchi, Jpn. J. Appl. Phys. 44, L539-L542 (2005) |
H. Mimura, H. Yumoto, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, and K. Yamauchi, Rev. Sci. Instrum. 76, 045102 (2005) |
H. Mimura, K. Yamauchi, K. Yamamura, A. Kubota, S. Matsuyama, Y. Sano, K. Ueno, K. Endo, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, and Y. Mori, J. Synchrotron Rad. 11, 343-346 (2004) |
K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori, Jpn. J. Appl. Phys. 42, 7129-7134 (2003) |
K. Yamamura, K. Yamauchi, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori, Rev. Sci. Instrum. 74, 4549-4553 (2003) |
K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori, Rev. Sci. Instrum. 74, 2894-2898 (2003) |
K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori, J. Synchrotron Rad. 9, 313-316 (2002) |
A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, Y. Mori, K. Yamauchi, K. Yamamura, and A. Saito, J. Synchrotron Rad. 9, 223-228 (2002) |
Related experimental techniques
Questionnaire
With user's own instruments.
Ease of measurement
With a great skill
Ease of analysis
Middle
How many shifts were needed for taking whole data in the figure?
Four-nine shifts